题名 | Resistive switching characteristic and uniformity of low-power HfO x -based resistive random access memory with the BN insertion layer |
链接 | http://iopscience.iop.org/article/10.1088/1674-1056/25/10/107302/meta;jsessionid=6242ED6AB654B5BF6484D2A5E449B2FC.c1.iopscience.cld.iop.org |
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